ASML denies US claim its EUV lithography machines were sent to China

U.S. Commerce Secretary Howard Lutnick has questioned Dutch chip‑equipment maker ASML over allegations that an extreme ultraviolet (EUV) lithography system may have reached China in breach of export‑control rules. The United States says it has information suggesting ASML exported equipment related to EUV machines, which are restricted under the Wassenaar Arrangement, and is reviewing possible legislative action such as the MATCH Act to bar further Dutch lithography sales to China.

ASML has responded that none of its 314 operational EUV systems – plus 26 decommissioned units – are located in China and that the company can continuously monitor each machine’s status. The firm stresses that only its own technicians can move or install the sensitive equipment, making an illegal transfer highly unlikely. Nonetheless, Chinese authorities continue to pursue domestic EUV capabilities; a prototype built in Shenzhen by a team that includes former ASML engineers is reported to be operational, with production targets set for the late 2020s. China remains ASML’s largest market, accounting for roughly one‑third of its 2025 revenue.

The Dutch government is under pressure from Washington to enforce export restrictions, with the Dutch trade minister visiting the United States to assure U.S. officials of compliance. The dispute highlights the broader tension between Western export‑control policies and China’s drive for semiconductor self‑sufficiency.