ASML High‑NA EUV Lithography System Arrives at Albany NanoTech, New York

Components of ASML’s new High‑Numerical Aperture Extreme Ultraviolet (High‑NA EUV) lithography machine were delivered to the Albany NanoTech Complex, marking the first major shipment for North America’s inaugural open‑access research center. Governor Kathy Hochul announced the arrival on July 21, saying the milestone “brings us one step closer to securing New York’s future as the nation’s home base for semiconductor innovation and world‑class research and development.”

The equipment, valued at roughly $400 million per unit, features a 0.55 numerical aperture, 8‑nanometer resolution and the ability to print features up to 1.7 times smaller than previous systems, enabling future logic chips below the 2‑nanometer node. NY Creates, which oversees the facility, is partnering with IBM, Micron and Tokyo Electron. NY Creates CEO Dave Anderson called the delivery “a transformative development for U.S.‑based R&D.” The system is expected to be fully operational by the end of the year and to support hundreds of permanent jobs while advancing chip design and testing capabilities in the United States.