ASML warns US MATCH Act could accelerate China's semiconductor self-sufficiency

ASML, the leading manufacturer of lithography equipment, has expressed opposition to the proposed MATCH Act currently under deliberation by the US Congress. The act aims to implement stricter export restrictions on deep ultraviolet (DUV) lithography machines to China.

ASML Chief Financial Officer Roger Dassen stated that if the legislation passes following the US midterm elections, it could prove counterproductive by accelerating China's development of competitive domestic technologies. China currently accounts for approximately 20% of ASML's total net sales, driven by strong demand for mature logic and memory chips.

Separately, reports indicate ASML plans to implement a 10% price increase on replacement components for EUV and DUV equipment supplied to South Korean clients, including Samsung and SK Hynix, starting in January 2027. This move has reportedly met opposition from TSMC, as semiconductor manufacturers face rising operational costs amid shifting industry dynamics.