Intel ships first chips using ASML's High‑NA EUV lithography

Intel announced that it has shipped the first commercial chips manufactured with high‑numerical aperture extreme ultraviolet (High‑NA EUV) lithography supplied by ASML. The chips belong to the Panther Lake processor family and are built on Intel’s 14A process node, targeting client‑computing markets and the growing AI chip demand.

The High‑NA EUV system, costing about $400 million per machine, uses a 0.55 numerical‑aperture lens that can print features as small as an 8 nm half‑pitch, reducing the need for multiple patterning steps and improving yield. Intel began using the tool in 2024 at its Hillsboro, Oregon R&D site and now employs it for specific layers of the Panther Lake chips produced at its D1X factory in Oregon. The deployment is intended to collect data, optimise the equipment and ramp volume through 2025‑2026, reinforcing Intel’s position in advanced logic manufacturing.