Nvidia CEO predicts China will develop own lithography tools within 4 years

Nvidia CEO Jen-Hsun Huang suggests that China may develop its own lithography tools within the next four years. Currently, China lacks access to modern Extreme Ultraviolet (EUV) scanners from ASML and relies on older technology. To compensate, Chinese firms like SMIC are utilizing multi-patterning techniques to achieve finer structures, though this approach significantly increases production time and costs.

While China is investing heavily in chip manufacturing, AI, and quantum computing, experts note that the complexity of pushing existing lithography tools to their limits increases exponentially. Although SMIC has successfully produced the HiSilicon Kirin 9030 processor using advanced processes, the reliance on older tools may eventually reach a technical ceiling. China is reportedly working on alternative technologies that could be ready by 2028-2029, though their viability for mass production remains uncertain.