Russia completes first 130 nm photolithography machine prototype

Russia has completed the first prototype of a 130 nm photolithography machine, marking a step in the country's efforts to develop domestic semiconductor manufacturing equipment. Developed by the Zelenograd Nano Center (ZNTC), the system uses 200 mm wafers and is currently undergoing technical testing and internal acceptance.

The project received approximately $70 million from the Russian Ministry of Industry and Trade. While ZNTC plans to sign batch supply contracts starting in 2027, the equipment is not expected to process commercial wafers until at least 2029. The technology is estimated to be roughly 25 years behind current international commercial standards, comparable to systems commercialized by ASML in the early 2000s.

Development involved international cooperation, with the Belarusian company Planar playing a key role in developing the lithography system and main mechanical assemblies. The Russian company Lassard provided the laser components.